Microstructural studies of TiN coatings prepared by PVD and IBAD

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Назив:	Microstructural studies of TiN coatings prepared by PVD and IBAD
Аутори:	Škorić, Branko Kakaš D. Bibic N. Rakita M.
Датум издавања:	20-сеп-2004
Часопис:	Surface Science
Сажетак:	Titanium nitride (TiN) films have been deposited by physical vapour deposition (PVD), with BALZER equipment, and ion beam assisted deposition (IBAD) process, in DANFYSIK chamber. TiN thin films were grown, during IBAD process, by evaporation of Ti in presence of N2 and simultaneous bombarded with Ar+ ions. The evolution of the microstructure from porous and columnar grains to densel packed grains is accompanied by changes in mechanical and physical properties. © 2004 Elsevier B.V. All rights reserved.
URI:	https://open.uns.ac.rs/handle/123456789/15567
ISSN:	396028
DOI:	10.1016/j.susc.2004.06.060
Налази се у колекцијама:	FTN Publikacije/Publications