Please use this identifier to cite or link to this item: https://open.uns.ac.rs/handle/123456789/12273
Title: Spatial distribution of electron in doped films
Authors: Tošić B.
Mašković L.
Maksimović, Rado 
Issue Date: 15-Nov-1994
Journal: Physica A: Statistical Mechanics and its Applications
Abstract: We have analysed the changes induced by the doping of Fermi-electron density in films. Two types of doping were studied: sputtering and vaporization and it was concluded that it is easier to move the maximal density towards the boundary surface by vaporization. For this reason, vaporization is a more perspective method for the current delocalization in new high-temperature superconductors. © 1994.
URI: https://open.uns.ac.rs/handle/123456789/12273
ISSN: 3784371
DOI: 10.1016/0378-4371(94)00137-5
Appears in Collections:FTN Publikacije/Publications

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