Please use this identifier to cite or link to this item: https://open.uns.ac.rs/handle/123456789/4053
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dc.contributor.authorNataša Samardžićen_US
dc.contributor.authorMionić M.en_US
dc.contributor.authorDakić B.en_US
dc.contributor.authorHofmann H.en_US
dc.contributor.authorStaniša Dautovićen_US
dc.contributor.authorGoran Stojanovićen_US
dc.date.accessioned2019-09-23T10:31:46Z-
dc.date.available2019-09-23T10:31:46Z-
dc.date.issued2015-06-01-
dc.identifier.issn189383en_US
dc.identifier.urihttps://open.uns.ac.rs/handle/123456789/4053-
dc.description.abstract© 1963-2012 IEEE. We demonstrate the ink-jet printed fabrication technique for TiO2-based memristor, followed by detailed analysis of electrical characteristics and development of a new model that considers observed phenomena of quantized conductance steps. The existence of pinched hysteretic current-voltage characteristics is evidence of memristive behavior, provided by the reversible atomic rearrangement taking place in the functional layer. For the first time, performed electrical measurement on the micrometer thickness devices based on TiO2 active layer has captured the plateaux steps of the conductance at integer multiples of elementary quantum conductance. This behavior is consistent with the assumption that transport from electrode to electrode emerges through confined paths of conductive filaments with radius in the nanometer size range. Moreover, we introduce a novel model, based on the diffusion equation for ballistic transport in memristive devices, which considers the conductance plateaux steps.en_US
dc.relationH2020 MEDLEMen_US
dc.relation.ispartofIEEE Transactions on Electron Devicesen_US
dc.titleAnalysis of quantized electrical characteristics of microscale TiO<inf>2</inf> ink-jet printed memristoren_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.doi10.1109/TED.2015.2421283-
dc.identifier.scopus2-s2.0-85027949361-
dc.identifier.urlhttps://api.elsevier.com/content/abstract/scopus_id/85027949361-
dc.description.versionUnknownen_US
dc.relation.lastpage1904en_US
dc.relation.firstpage1898en_US
dc.relation.issue6en_US
dc.relation.volume62en_US
item.grantfulltextnone-
item.fulltextNo Fulltext-
crisitem.author.deptDepartman za energetiku, elektroniku i telekomunikacije-
crisitem.author.deptDepartman za energetiku, elektroniku i telekomunikacije-
crisitem.author.deptDepartman za energetiku, elektroniku i telekomunikacije-
crisitem.author.orcid0000-0003-2098-189X-
crisitem.author.parentorgFakultet tehničkih nauka-
crisitem.author.parentorgFakultet tehničkih nauka-
crisitem.author.parentorgFakultet tehničkih nauka-
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