Study of inhibition properties of some thiazole derivatives against copper corrosion

Abstract

The inhibitor efficiency of some thiazole derivatives against copper corrosion in acidic sulfate solution were investigated using polarization and electrochemical impedance spectroscopy (EIS) methods. Protection efficiency of four organic molecules: 5-benzylidene-2,4-dioxotetrahydro-1,3-thiazole (5-BDT), 5-(4-isopropylbenzylidene)-2,4-dioxotetrahydro-1,3-thiazole (5-IPBDT), 5-(3-thenylidene)-2,4-dioxotetrahydro-1,3-thiazole (5-TDT) and 5-(3,4-dimetoxybenzylidene)-2,4-dioxotetrahydro-1,3-thiazole (5-MBDT) were investigated on copper electrode in 0.1moldm–3 Na2SO4 solution at pH=2.95. Polarization measurements indicates that all investigated thiazole derivatives could reduces the cathodic reaction rate on copper electrode surface in 0.1 mol dm–3 acidic Na2SO4 solution. In investigation range concentration 0.01mmoldm-3 has the best inhibitor efficiency in case of all investigated thiazole. The best protection is obtained in presence of 5-IPBDT derivatives. EIS results showed that investigated thiazole derivatives formed a film on copper surface which was able to protect copper against corrosion in acidic media. 5-IPBDT derivative only formed closely packed inhibitor film, which is able to protect copper surface during the time.