Please use this identifier to cite or link to this item: https://open.uns.ac.rs/handle/123456789/14978
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dc.contributor.authorZivanov M.en
dc.contributor.authorZivanov L.en
dc.date.accessioned2020-03-03T14:58:05Z-
dc.date.available2020-03-03T14:58:05Z-
dc.date.issued1997-12-01en
dc.identifier.urihttps://open.uns.ac.rs/handle/123456789/14978-
dc.description.abstractThe transport characteristics of heavily doped n-type InP was calculated for free electron concentrations from 1017 to 1021 cm-3. The nonparabolic energy dispersion according to the kp model was taken into account. Detailed physical model with all important scattering mechanisms was included. The iterative method was used for determination the drift and Hall electron mobilities. The influence of upper minima was taken by including density of states effective mass. Calculations are performed at room temperature (300 K). Very good agreement between calculated results and available experimental data was obtained. Approximate relation for electron mobility was given, which may be used for simulation.en
dc.relation.ispartofProceedings of the International Conference on Microelectronicsen
dc.titleDetermination of transport parameters in heavily doped n-type InPen
dc.typeConference Paperen
dc.identifier.scopus2-s2.0-0031369119en
dc.identifier.urlhttps://api.elsevier.com/content/abstract/scopus_id/0031369119en
dc.relation.lastpage188en
dc.relation.firstpage185en
dc.relation.volume1en
item.grantfulltextnone-
item.fulltextNo Fulltext-
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